Publication:

Widening of FUSI RTP process window by spike anneal

Date

2007
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLauwers, Anne
dc.contributor.authorMertens, Sofie
dc.contributor.authorAbsil, Philippe
dc.contributor.authorChiarella, Thomas
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBrijs, Bert
dc.contributor.authorVrancken, Christa
dc.contributor.authorBiesemans, Serge
dc.contributor.authorKittl, Jorge
dc.contributor.authorVerheyden, Kurt
dc.contributor.authorVanormelingen, Koen
dc.contributor.authorGranneman, Ernst
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.accessioned2021-10-16T17:20:42Z
dc.date.available2021-10-16T17:20:42Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12451
dc.source.beginpage111
dc.source.conference15th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate2/10/2007
dc.source.conferencelocationCatania Sicily
dc.source.endpage117
dc.title

Widening of FUSI RTP process window by spike anneal

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions