Publication:

High resolution dopant/carrier profiling for deep submicron technologies

Date

1999
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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClarysse, Trudo
dc.contributor.authorDe Wolf, Peter
dc.contributor.authorEyben, Pierre
dc.contributor.authorHaegeman, Bart
dc.contributor.authorXu, Mingwei
dc.contributor.authorTrenkler, Thomas
dc.contributor.authorHantschel, Thomas
dc.contributor.authorStephenson, Robert
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorConard, Thierry
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T11:50:41Z
dc.date.available2021-10-14T11:50:41Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3961
dc.source.conference9th Canadian Semiconductor Technology Conference; July 1999; Ottawa, Canada.
dc.source.conferencelocation
dc.title

High resolution dopant/carrier profiling for deep submicron technologies

dc.typeOral presentation
dspace.entity.typePublication
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