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Experimental investigation of the impact of line-edge roughness on MOSFET performance and yield

Date

2003
Proceedings Paper
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dc.contributor.authorCroon, Jeroen
dc.contributor.authorLeunissen, Peter
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBenndorf, Michael
dc.contributor.authorRooyackers, Rita
dc.contributor.authorRonse, Kurt
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorSansen, Willy
dc.contributor.authorMaes, Herman
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.accessioned2021-10-15T04:13:41Z
dc.date.available2021-10-15T04:13:41Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7365
dc.source.beginpage227
dc.source.conference33rd European Solid-State Devices Research Conference - ESSDERC
dc.source.conferencedate16/09/2003
dc.source.conferencelocationEstoril Portugal
dc.source.endpage230
dc.title

Experimental investigation of the impact of line-edge roughness on MOSFET performance and yield

dc.typeProceedings paper
dspace.entity.typePublication
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