Publication:

Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact

Date

2025-APR 1

Journal article

https://doi.org/10.1117/1.JMM.24.2.024004

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Author(s)

;

;

De Simone, Danilo

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;

;

Billington, Hans

;

Fallica, Roberto

;

Charley, Anne-Laure

;

De Gendt, Stefan

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

Statistics

45 since deposited on 2025-08-03

2last month

Acq. date: 2026-02-24