Publication:

Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact

Date

2025-APR 1
Journal article
https://doi.org/10.1117/1.JMM.24.2.024004
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dc.contributor.authorZidan, Mohamed
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSaib, Mohamed
dc.contributor.authorMoussa, Alain
dc.contributor.authorBillington, Hans
dc.contributor.authorFallica, Roberto
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorLorusso, Gian Francesco
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorBillington, Hans
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecZidan, Mohamed::0000-0002-7201-7405
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecSaib, Mohamed::0000-0002-5153-5553
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2025-08-03T03:58:49Z
dc.date.available2025-08-03T03:58:49Z
dc.date.issued2025-APR 1
dc.identifier.doi10.1117/1.JMM.24.2.024004
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/46023
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage024004-1
dc.source.endpage024004-18
dc.source.issue2
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages18
dc.source.volume24
dc.title

Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact

dc.typeJournal article
dspace.entity.typePublication
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