Publication:
Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact
| dc.contributor.author | Zidan, Mohamed | |
| dc.contributor.author | Lorusso, Gian | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Saib, Mohamed | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Billington, Hans | |
| dc.contributor.author | Fallica, Roberto | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.imecauthor | Zidan, Mohamed | |
| dc.contributor.imecauthor | Lorusso, Gian Francesco | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Saib, Mohamed | |
| dc.contributor.imecauthor | Moussa, Alain | |
| dc.contributor.imecauthor | Billington, Hans | |
| dc.contributor.imecauthor | Fallica, Roberto | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | Zidan, Mohamed::0000-0002-7201-7405 | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.contributor.orcidimec | Saib, Mohamed::0000-0002-5153-5553 | |
| dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
| dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
| dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2025-08-03T03:58:49Z | |
| dc.date.available | 2025-08-03T03:58:49Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/1.jmm.24.2.024004 | |
| dc.identifier.issn | 1932-5150 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/46023 | |
| dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | |
| dc.source.beginpage | 024004-1 | |
| dc.source.endpage | 024004-18 | |
| dc.source.issue | 2 | |
| dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
| dc.source.numberofpages | 18 | |
| dc.source.volume | 24 | |
| dc.title | Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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