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Thermal stability and scalability of zr-aluminate-based high-k gate stacks

Date

2002
Proceedings Paper
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dc.contributor.authorChen, Jerry
dc.contributor.authorCartier, Eduard
dc.contributor.authorCarter, Richard
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorZhao, Chao
dc.contributor.authorPétry, Jasmine
dc.contributor.authorCosnier, Vincent
dc.contributor.authorXu, Zhen
dc.contributor.authorKerber, Andreas
dc.contributor.authorTsai, Wilman
dc.contributor.authorYoung, Edward
dc.contributor.authorKubicek, Stefan
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorCopel, M.
dc.contributor.authorBesling, Wim
dc.contributor.authorBajolet, Philippe
dc.contributor.authorMaes, Jan
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMaes, Jan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T21:13:47Z
dc.date.available2021-10-14T21:13:47Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6100
dc.source.beginpage192
dc.source.conferenceSymposium on VLSI Technology: Digest of Technical Papers
dc.source.conferencedate11/06/2002
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage193
dc.title

Thermal stability and scalability of zr-aluminate-based high-k gate stacks

dc.typeProceedings paper
dspace.entity.typePublication
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