Publication:

Precuring implant photoresists for shrink and patterning control

Date

2013
Journal article
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dc.contributor.authorWinroth, Gustaf
dc.contributor.authorRosseel, Erik
dc.contributor.authorDelvaux, Christie
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorErcken, Monique
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorErcken, Monique
dc.date.accessioned2021-10-21T14:38:28Z
dc.date.available2021-10-21T14:38:28Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23397
dc.identifier.urlhttp://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1735280
dc.source.beginpage41303
dc.source.issue4
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume12
dc.title

Precuring implant photoresists for shrink and patterning control

dc.typeJournal article
dspace.entity.typePublication
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