A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation

dc.contributor.author	Robertson, Stewart
dc.contributor.author	Schramm, Robert
dc.contributor.author	Pret, Alessandro Vaglio
dc.contributor.author	Wiaux, Vincent
dc.contributor.imecauthor	Wiaux, Vincent
dc.contributor.orcidimec	Wiaux, Vincent::0000-0002-8923-5708
dc.date.accessioned	2024-02-05T13:31:03Z
dc.date.available	2024-01-13T17:47:50Z
dc.date.available	2024-02-05T13:31:03Z
dc.date.issued	2023
dc.identifier.doi	10.1117/12.2688230
dc.identifier.eisbn	978-1-5106-6749-5
dc.identifier.isbn	978-1-5106-6748-8
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/43406
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 1275003
dc.source.conference	International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	OCT 02-05, 2023
dc.source.conferencelocation	Monterey
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	8
dc.source.volume	12750
dc.title	A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation
dc.type	Proceedings paper
dspace.entity.type	Publication
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