Publication:

Understanding Selectivity Loss Mechanisms in Selective Material Deposition by Area Deactivation on 10 nm Cu/SiO2 Patterns

Date

2022-03-29
Journal article
https://doi.org/10.1021/acsaelm.1c01348
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dc.contributor.authorViva, Alessandro
dc.contributor.authorPasquali, Mattia
dc.contributor.authorCarolan, Patrick
dc.contributor.authorSergeant, Stefanie
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorPasquali, Mattia
dc.contributor.imecauthorCarolan, Patrick
dc.contributor.imecauthorSergeant, Stefanie
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidextAlessandro, Viva::0000-0002-6349-8075
dc.contributor.orcidimecPasquali, Mattia::0000-0002-1309-1082
dc.contributor.orcidimecCarolan, Patrick::0000-0001-5931-3093
dc.contributor.orcidimecSergeant, Stefanie::0000-0001-9923-0903
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2022-08-29T08:12:35Z
dc.date.available2022-05-06T08:19:21Z
dc.date.available2022-08-29T08:12:35Z
dc.date.embargo9999-12-31
dc.date.issued2022-03-29
dc.identifier.doihttps://doi.org/10.1021/acsaelm.1c01348
dc.identifier.issn2637-6113
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39760
dc.source.beginpage1703
dc.source.endpage1714
dc.source.issue4
dc.source.journalACS Applied Electronic Materials
dc.source.numberofpages12
dc.source.volume4
dc.title

Understanding Selectivity Loss Mechanisms in Selective Material Deposition by Area Deactivation on 10 nm Cu/SiO2 Patterns

dc.typeJournal article
dspace.entity.typePublication
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