Effects of bias, pressure and temperature in plasma damage of ultra low-k films

dc.contributor.author	Urbanowicz, Adam
dc.contributor.author	Humbert, Aurelie
dc.contributor.author	Mannaert, Geert
dc.contributor.author	Tokei, Zsolt
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.imecauthor	Humbert, Aurelie
dc.contributor.imecauthor	Mannaert, Geert
dc.contributor.imecauthor	Tokei, Zsolt
dc.contributor.orcidimec	Humbert, Aurelie::0000-0002-2538-8991
dc.date.accessioned	2021-10-17T11:28:03Z
dc.date.available	2021-10-17T11:28:03Z
dc.date.issued	2008
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14587
dc.source.beginpage	317
dc.source.conference	Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate	18/09/2006
dc.source.conferencelocation	Antwerpen Belgium
dc.source.endpage	320
dc.title	Effects of bias, pressure and temperature in plasma damage of ultra low-k films
dc.type	Proceedings paper
dspace.entity.type	Publication
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