Publication:
Cluster optimization to improve total CD control as an enabler for double patterning
Date
| dc.contributor.author | Tedeschi, Len | |
| dc.contributor.author | Rosslee, C. | |
| dc.contributor.author | Laidler, David | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | D'have, Koen | |
| dc.contributor.imecauthor | Laidler, David | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.imecauthor | D'have, Koen | |
| dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
| dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
| dc.date.accessioned | 2021-10-17T11:10:41Z | |
| dc.date.available | 2021-10-17T11:10:41Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14541 | |
| dc.source.beginpage | 714023 | |
| dc.source.conference | Litography ASIA | |
| dc.source.conferencedate | 4/11/2008 | |
| dc.source.conferencelocation | Taipei Taiwan | |
| dc.title | Cluster optimization to improve total CD control as an enabler for double patterning | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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