Publication:

Performance enhancement of PFET planar devices by plasma immersion ion implantation (P3i)

Date

2008
Proceedings Paper
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dc.contributor.authorOrtolland, Claude
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorKerner, Christoph
dc.contributor.authorChiarella, Thomas
dc.contributor.authorEyben, Pierre
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorAgua Borniquel, Jose
dc.contributor.authorPoon, Tse
dc.contributor.authorSanthanam, Kartik
dc.contributor.authorPorshnev, Peter
dc.contributor.authorFoad, Majeed
dc.contributor.authorSchreutelkamp, Robert
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorFelch, Susan
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.accessioned2021-10-17T09:31:01Z
dc.date.available2021-10-17T09:31:01Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14255
dc.source.beginpage465
dc.source.conference17th International Conference on Ion Implantation Technology - IIT
dc.source.conferencedate8/06/2008
dc.source.conferencelocationMonterey, CA USA
dc.source.endpage468
dc.title

Performance enhancement of PFET planar devices by plasma immersion ion implantation (P3i)

dc.typeProceedings paper
dspace.entity.typePublication
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