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Combining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wires

Date

2018
Proceedings Paper
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dc.contributor.authorFavia, Paola
dc.contributor.authorCelano, Umberto
dc.contributor.authorDrijbooms, Chris
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorCapogreco, Elena
dc.contributor.authorVancoille, Eric
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorDrijbooms, Chris
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.date.accessioned2021-10-25T18:35:26Z
dc.date.available2021-10-25T18:35:26Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30697
dc.source.conference19th International Microscopy Congress - IMC19
dc.source.conferencedate9/09/2018
dc.source.conferencelocationSydney Australia
dc.title

Combining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wires

dc.typeProceedings paper
dspace.entity.typePublication
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