Publication:
Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs
| dc.contributor.author | Panarella, Luca | |
| dc.contributor.author | Kaczer, Ben | |
| dc.contributor.author | Smets, Quentin | |
| dc.contributor.author | Verreck, Devin | |
| dc.contributor.author | Schram, Tom | |
| dc.contributor.author | Cott, Daire | |
| dc.contributor.author | Lin, Dennis | |
| dc.contributor.author | Tyaginov, Stanislav | |
| dc.contributor.author | Asselberghs, Inge | |
| dc.contributor.author | Lockhart de la Rosa, Cesar Javier | |
| dc.contributor.author | Kar, Gouri Sankar | |
| dc.contributor.author | Afanasiev, Valeri | |
| dc.contributor.imecauthor | Panarella, Luca | |
| dc.contributor.imecauthor | Kaczer, Ben | |
| dc.contributor.imecauthor | Smets, Quentin | |
| dc.contributor.imecauthor | Verreck, Devin | |
| dc.contributor.imecauthor | Schram, Tom | |
| dc.contributor.imecauthor | Cott, Daire | |
| dc.contributor.imecauthor | Lin, Dennis | |
| dc.contributor.imecauthor | Tyaginov, Stanislav | |
| dc.contributor.imecauthor | Asselberghs, Inge | |
| dc.contributor.imecauthor | Lockhart de la Rosa, Cesar Javier | |
| dc.contributor.imecauthor | Kar, Gouri Sankar | |
| dc.contributor.imecauthor | Afanasiev, Valeri | |
| dc.contributor.orcidimec | Kaczer, Ben::0000-0002-1484-4007 | |
| dc.contributor.orcidimec | Smets, Quentin::0000-0002-2356-5915 | |
| dc.contributor.orcidimec | Verreck, Devin::0000-0002-3833-5880 | |
| dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
| dc.contributor.orcidimec | Tyaginov, Stanislav::0000-0002-5348-2096 | |
| dc.contributor.orcidimec | Asselberghs, Inge::0000-0001-8371-3222 | |
| dc.contributor.orcidimec | Lockhart de la Rosa, Cesar Javier::0000-0002-1401-0141 | |
| dc.contributor.orcidimec | Afanasiev, Valeri::0000-0001-5018-4539 | |
| dc.contributor.orcidimec | Cott, Daire::0009-0000-0890-8820 | |
| dc.contributor.orcidimec | Lin, Dennis::0000-0002-1577-6050 | |
| dc.date.accessioned | 2023-11-28T08:41:32Z | |
| dc.date.available | 2023-07-15T17:05:46Z | |
| dc.date.available | 2023-11-28T08:41:32Z | |
| dc.date.issued | 2023 | |
| dc.description.wosFundingText | This work was done in the imec IIAP core CMOS programs and supported by The Research Foundation - Flanders (FWO). | |
| dc.identifier.doi | 10.1109/IRPS48203.2023.10117803 | |
| dc.identifier.eisbn | 978-1-6654-5672-2 | |
| dc.identifier.issn | 1541-7026 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42157 | |
| dc.publisher | IEEE | |
| dc.source.conference | 61st IEEE International Reliability Physics Symposium (IRPS) | |
| dc.source.conferencedate | MAR 26-30, 2023 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | na | |
| dc.source.numberofpages | 6 | |
| dc.subject.keywords | AL2O3 | |
| dc.title | Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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