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High resolution medium energy ion scattering analysis for the quantitative depth profiling of ultra thin high-k Hf based films

Date

2009
Meeting abstract
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dc.contributor.authorVan den berg, J.
dc.contributor.authorReading, M.A.
dc.contributor.authorArmour, D.G.
dc.contributor.authorBailey, P.
dc.contributor.authorNoakes, T.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-18T03:58:37Z
dc.date.available2021-10-18T03:58:37Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16360
dc.source.conference5th International Workshop on High-Resolution Depth Profiling
dc.source.conferencedate15/11/2009
dc.source.conferencelocationKyoto Japan
dc.title

High resolution medium energy ion scattering analysis for the quantitative depth profiling of ultra thin high-k Hf based films

dc.typeMeeting abstract
dspace.entity.typePublication
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