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Ternary CoxFe(1-x)Si2 and NixFe(1-x)Si2 formed by ion implantation in silicon

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1942 since deposited on 2021-10-14
2last month
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Acq. date: 2026-01-26

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1942 since deposited on 2021-10-14
2last month
1last week
Acq. date: 2026-01-26

Citations