Publication:
Ternary CoxFe(1-x)Si2 and NixFe(1-x)Si2 formed by ion implantation in silicon
Date
| dc.contributor.author | Fetzer, C. | |
| dc.contributor.author | Dézsi, I. | |
| dc.contributor.author | Vantomme, Andre | |
| dc.contributor.author | Wu, M.F. | |
| dc.contributor.author | Jin, S. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.imecauthor | Vantomme, Andre | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.date.accessioned | 2021-10-14T21:37:12Z | |
| dc.date.available | 2021-10-14T21:37:12Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6321 | |
| dc.source.beginpage | 3688 | |
| dc.source.endpage | 3693 | |
| dc.source.issue | 7 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.volume | 92 | |
| dc.title | Ternary CoxFe(1-x)Si2 and NixFe(1-x)Si2 formed by ion implantation in silicon | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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