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TCAD Modeling of Temperature Activation of the Hysteresis Characteristics of Lateral 4H-SiC MOSFETs
Publication:
TCAD Modeling of Temperature Activation of the Hysteresis Characteristics of Lateral 4H-SiC MOSFETs
Date
2022-04-19
Journal article
https://doi.org/10.1109/TED.2022.3166123
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2.92 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vasilev, Alexander
;
Jech, Markus
;
Grill, Alexander
;
Rzepa, Gerhard
;
Schleich, Christian
;
Tyaginov, Stanislav
;
Makarov, Alexander
;
Pobegen, Gregor
;
Grasser, Tibor
;
Waltl, Michael
Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
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Downloads
104
since deposited on 2022-05-19
36
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Views
1639
since deposited on 2022-05-19
395
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations