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Development and evaluation of a-SiC:H films using a dimethylsilacyclopentane precursor as a low -k Cu capping layer in advanced interconnects

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1897 since deposited on 2021-10-21
3last month
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Acq. date: 2026-04-05

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Views

1897 since deposited on 2021-10-21
3last month
1last week
Acq. date: 2026-04-05

Citations