Publication:
Effects of plasma surface treatment on the self-forming barrier process in porous SiOCH
Date
| dc.contributor.author | Chung, Seung-Min | |
| dc.contributor.author | Koike, Junichi | |
| dc.contributor.author | Tokei, Zsolt | |
| dc.contributor.imecauthor | Tokei, Zsolt | |
| dc.date.accessioned | 2021-10-17T06:32:48Z | |
| dc.date.available | 2021-10-17T06:32:48Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13526 | |
| dc.source.beginpage | N03.10 | |
| dc.source.conference | Materials and Processes for Advanced Interconnects for Microelectronics | |
| dc.source.conferencedate | 24/03/2008 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | Effects of plasma surface treatment on the self-forming barrier process in porous SiOCH | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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