Publication:
Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
Date
| dc.contributor.author | Torregiani, Cristina | |
| dc.contributor.author | Van Bockstael, Charlotte | |
| dc.contributor.author | Detavernier, Christophe | |
| dc.contributor.author | Lavoie, Christian | |
| dc.contributor.author | Lauwers, Anne | |
| dc.contributor.author | Kittl, Jorge | |
| dc.contributor.imecauthor | Lauwers, Anne | |
| dc.contributor.thesisadvisor | Maex, Karen | |
| dc.date.accessioned | 2021-10-16T20:13:35Z | |
| dc.date.available | 2021-10-16T20:13:35Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12984 | |
| dc.identifier.url | http://dx.doi.org/10.1016/j.mee.2007.05.054 | |
| dc.source.beginpage | 2533 | |
| dc.source.endpage | 2536 | |
| dc.source.issue | 11 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 84 | |
| dc.title | Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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