Publication:

Dielectric on dielectric area-selective deposition by a combination of atomic layer deposition and organic film passivation for self-aligned via patterning

Date

2018
Meeting abstract
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dc.contributor.authorPasquali, Mattia
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.contributor.authorIlliberi, Andrea
dc.contributor.authorVerni, Giuseppe
dc.contributor.authorDeng, Shaoren
dc.contributor.authorGivens, Michael
dc.contributor.imecauthorPasquali, Mattia
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorIlliberi, Andrea
dc.contributor.imecauthorDeng, Shaoren
dc.contributor.imecauthorGivens, Michael
dc.contributor.orcidimecPasquali, Mattia::0000-0002-1309-1082
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2021-10-26T00:52:40Z
dc.date.available2021-10-26T00:52:40Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31494
dc.identifier.urlhttps://www.asd2019-workshop.org/index.php/presentation-download/abstract-book
dc.source.beginpage24
dc.source.conferenceASD 2019
dc.source.conferencedate4/04/2019
dc.source.conferencelocationLeuven Belgium
dc.source.endpage24
dc.title

Dielectric on dielectric area-selective deposition by a combination of atomic layer deposition and organic film passivation for self-aligned via patterning

dc.typeMeeting abstract
dspace.entity.typePublication
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