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Zero-energy SIMS: The role of surface roughness development with XeF2 based etching

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dc.contributor.authorVanhove, Nico
dc.contributor.authorLievens, Peter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-18T04:33:34Z
dc.date.available2021-10-18T04:33:34Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16444
dc.source.conferenceSIMS XVII
dc.source.conferencedate13/09/2009
dc.source.conferencelocationToronto Canada
dc.title

Zero-energy SIMS: The role of surface roughness development with XeF2 based etching

dc.typeOral presentation
dspace.entity.typePublication
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