Publication:

Exploring crystal recovery and dopant activation in coated laser annealing on ion implanted 4H-SiC epitaxial layers

 
dc.contributor.authorCalabretta, C.
dc.contributor.authorPecora, A.
dc.contributor.authorAgati, Marta
dc.contributor.authorMuoio, A.
dc.contributor.authorScuderi, V.
dc.contributor.authorPrivitera, S.
dc.contributor.authorReitano, R.
dc.contributor.authorBoninelli, S.
dc.contributor.authorLa Via, F.
dc.contributor.imecauthorAgati, Marta
dc.contributor.orcidimecAgati, Marta::0000-0002-2108-4800
dc.date.accessioned2025-03-24T11:58:36Z
dc.date.available2024-03-26T17:00:54Z
dc.date.available2025-03-24T11:58:36Z
dc.date.issued2024
dc.description.wosFundingTextThis project has received funding from the European Union's Horizon 2020 research and innovation program under grant agreement No 823717 - ESTEEM3. This work has been partially funded by European Union (NextGeneration EU), through the MUR-PNRR project SAMOTHRACE (ECS00000022) This research was in part funded by the ECSEL-JU project REACTION (first and euRopEAn siC eigTh Inches pilOt liNe), Grant Agreement No. 783158.
dc.identifier.doi10.1016/j.mssp.2024.108175
dc.identifier.issn1369-8001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43733
dc.publisherELSEVIER SCI LTD
dc.source.beginpageArt. 108175
dc.source.endpageN/A
dc.source.issueMay
dc.source.journalMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
dc.source.numberofpages8
dc.source.volume174
dc.subject.keywordsSILICON-CARBIDE
dc.subject.keywordsAL
dc.subject.keywordsTECHNOLOGY
dc.subject.keywordsPHOSPHORUS
dc.title

Exploring crystal recovery and dopant activation in coated laser annealing on ion implanted 4H-SiC epitaxial layers

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections: