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Submicron processing of InAs based quantum wells: a new, highly selective wet etchant for AlSb
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Submicron processing of InAs based quantum wells: a new, highly selective wet etchant for AlSb
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Date
1997
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Morpurgo, A. F.
;
van Wees, B. J.
;
Klapwijk, T. M.
;
Borghs, Gustaaf
Journal
Appl. Phys. Lett.
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1926
since deposited on 2021-09-30
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Acq. date: 2025-12-12
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Metrics
Views
1926
since deposited on 2021-09-30
1
last month
Acq. date: 2025-12-12
Citations