Submicron processing of InAs based quantum wells: a new, highly selective wet etchant for AlSb

dc.contributor.author	Morpurgo, A. F.
dc.contributor.author	van Wees, B. J.
dc.contributor.author	Klapwijk, T. M.
dc.contributor.author	Borghs, Gustaaf
dc.contributor.imecauthor	Borghs, Gustaaf
dc.date.accessioned	2021-09-30T09:19:32Z
dc.date.available	2021-09-30T09:19:32Z
dc.date.embargo	9999-12-31
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2040
dc.source.beginpage	1435
dc.source.endpage	1437
dc.source.issue	11
dc.source.journal	Appl. Phys. Lett.
dc.source.volume	70
dc.title	Submicron processing of InAs based quantum wells: a new, highly selective wet etchant for AlSb
dc.type	Journal article
dspace.entity.type	Publication
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