Publication:

Characterization of high-k films grown by atomic layer deposition

Date

2002
Presentation
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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorConard, Thierry
dc.contributor.authorPetry, Jasmine
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGreen, Martin
dc.contributor.authorCartier, Eduard
dc.contributor.authorCopel, M.
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T23:45:00Z
dc.date.available2021-10-14T23:45:00Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6984
dc.source.conferenceMRS Spring Meeting
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Characterization of high-k films grown by atomic layer deposition

dc.typeOral presentation
dspace.entity.typePublication
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