Publication:

Unsupervised Machine Learning based CD-SEM image segregator for OPC and Process Window Estimation

Date

2020
Proceedings Paper
https://doi.org/10.1117/12.2552055
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dc.contributor.authorDey, Bappaditya
dc.contributor.authorCerbu, Dorin
dc.contributor.authorKhalil, Kasem
dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.contributor.authorDas, Sayantan
dc.contributor.authorSherazi, Yasser
dc.contributor.authorBayoumi, Magdy A.
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorCerbu, Dorin
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidextKhalil, Kasem::0000-0002-9659-8566
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.date.accessioned2021-11-08T11:40:29Z
dc.date.available2021-11-02T15:58:54Z
dc.date.available2021-11-03T11:18:43Z
dc.date.available2021-11-05T09:36:35Z
dc.date.available2021-11-08T11:40:29Z
dc.date.issued2020
dc.identifier.doi10.1117/12.2552055
dc.identifier.eisbn978-1-5106-3424-4
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37726
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conferenceConference on Design-Process-Technology Co-Optimization for Manufacturability XIV
dc.source.conferencedateFEB 26-27, 2020
dc.source.conferencelocationSan Jose
dc.source.journalNA
dc.source.numberofpages11
dc.source.volume11328
dc.title

Unsupervised Machine Learning based CD-SEM image segregator for OPC and Process Window Estimation

dc.typeProceedings paper
dspace.entity.typePublication
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