Publication:
A study of gate oxide damage due to the plasma etching process on sub-0.25μm technology
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2024 since deposited on 2021-10-14
2last month
Acq. date: 2026-08-06
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Statistics
Views
2024 since deposited on 2021-10-14
2last month
Acq. date: 2026-08-06
Citations