Publication:
A study of gate oxide damage due to the plasma etching process on sub-0.25μm technology
Date
| dc.contributor.author | Lee, Hean-Cheal | |
| dc.date.accessioned | 2021-10-14T11:29:33Z | |
| dc.date.available | 2021-10-14T11:29:33Z | |
| dc.date.issued | 1999-12 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3613 | |
| dc.title | A study of gate oxide damage due to the plasma etching process on sub-0.25μm technology | |
| dc.type | PHD thesis | |
| dspace.entity.type | Publication | |
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