Publication:

Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide

Date

2022-09-21
Journal article
https://doi.org/10.1021/acs.chemmater.2c02292
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dc.contributor.authorPoonkottil, Nithin
dc.contributor.authorMinjauw, Matthias M.
dc.contributor.authorWerbrouck, Andreas
dc.contributor.authorChecchia, Stefano
dc.contributor.authorSolano, Eduardo
dc.contributor.authorNisula, Mikko
dc.contributor.authorFranquet, Alexis
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorDendooven, Jolien
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.date.accessioned2023-01-04T11:12:06Z
dc.date.available2022-10-12T02:49:49Z
dc.date.available2022-10-19T14:03:33Z
dc.date.available2023-01-04T11:12:06Z
dc.date.embargo2023-09-21
dc.date.issued2022-09-21
dc.description.wosFundingTextThis project has received funding from the European Union's Horizon 2020 research and innovation program under the Marie Sklodowska-Curie grant agreement no. 765378. The authors would like to acknowledge Air Liquide for supplying the ToRuS precursor. We thank Ranjith. K. Ramachandran for useful discussions. M.M.M. and A.W. would like to thank the Flemish Research Foundation (FWO-Vlaanderen) . The Special Research Fund BOF of Ghent University (GOA 01G01513) is also acknowledged. Dr. Alexander Merkulov is thanked for performing the SIMS measurements. The ESRF is acknowledged for provision of beamtime under proposal number MA-4987 (doi.esrf.fr/10.15151/ESRF-ES-538779994) . The GIWAXS experiments were performed at the NCD-SWEET beamline at ALBA Synchrotron with the collaboration of ALBA staff.
dc.identifier.doi10.1021/acs.chemmater.2c02292
dc.identifier.issn0897-4756
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40554
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage8946
dc.source.endpage8958
dc.source.issue19
dc.source.journalCHEMISTRY OF MATERIALS
dc.source.numberofpages13
dc.source.volume34
dc.subject.keywordsOXIDE THIN-FILMS
dc.subject.keywordsCYCLIC VOLTAMMETRIC DEPOSITION
dc.subject.keywordsIN-SITU
dc.subject.keywordsELECTROCHEMICAL CAPACITORS
dc.subject.keywordsXPS INVESTIGATIONS
dc.subject.keywordsREACTION-MECHANISM
dc.subject.keywordsVAPOR-DEPOSITION
dc.subject.keywordsOXIDATION-STATE
dc.subject.keywordsHYDROUS RUO2
dc.subject.keywordsOXYGEN
dc.title

Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide

dc.typeJournal article
dspace.entity.typePublication
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