Publication:
Charge trapping in metal-ferroelectric-insulator-semiconductor structure with SrBi2Ta2O9/Al2O3/SiO2 stack
Date
| dc.contributor.author | Xu, Zhen | |
| dc.contributor.author | Kaczer, Ben | |
| dc.contributor.author | Johnson, Jo | |
| dc.contributor.author | Wouters, Dirk | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.imecauthor | Kaczer, Ben | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.contributor.orcidimec | Kaczer, Ben::0000-0002-1484-4007 | |
| dc.date.accessioned | 2021-10-15T18:04:56Z | |
| dc.date.available | 2021-10-15T18:04:56Z | |
| dc.date.issued | 2004-08 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9947 | |
| dc.source.beginpage | 1614 | |
| dc.source.endpage | 1619 | |
| dc.source.issue | 3 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.volume | 96 | |
| dc.title | Charge trapping in metal-ferroelectric-insulator-semiconductor structure with SrBi2Ta2O9/Al2O3/SiO2 stack | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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