Publication:
Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography
Date
| dc.contributor.author | Kempsell Sears, Monica | |
| dc.contributor.author | Bekaert, Joost | |
| dc.contributor.author | Smith, Bruce W. | |
| dc.contributor.imecauthor | Bekaert, Joost | |
| dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
| dc.date.accessioned | 2021-10-21T08:43:13Z | |
| dc.date.available | 2021-10-21T08:43:13Z | |
| dc.date.issued | 2013 | |
| dc.identifier.issn | 0003-6935 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22576 | |
| dc.identifier.url | http://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-52-3-314 | |
| dc.source.beginpage | 314 | |
| dc.source.endpage | 322 | |
| dc.source.issue | 3 | |
| dc.source.journal | Applied Optics | |
| dc.source.volume | 52 | |
| dc.title | Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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