Publication:

Readying directed self-assembly for patterning in semi-conductor manufacturing

Date

2013
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorGronheid, Roel
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorSingh, Arjun
dc.contributor.authorYounkin, Todd
dc.contributor.authorSayan, Safak
dc.contributor.authorChan, BT
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorPollentier, Ivan
dc.contributor.authorNealey, Paul
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-21T08:01:28Z
dc.date.available2021-10-21T08:01:28Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22434
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/26/6/26_779/_article
dc.source.beginpage779
dc.source.endpage791
dc.source.issue6
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume26
dc.title

Readying directed self-assembly for patterning in semi-conductor manufacturing

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
28623.pdf
Size:
14.72 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles