Co-optimization of lithographic and patterning processes for improved EPE performance

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Author(s)

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Timoshkov, Vadim

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de Loijer, Peter

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Morikita, Shinya

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Okada, Soichiro

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Kumar, Kaushik A.

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Biesemans, Serge

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Yaegashi, Hidetami

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Di Lorenzo, Paolo

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Beral, Christophe

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Lariviere, Stephane

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1945 since deposited on 2021-10-24

Acq. date: 2025-10-24