Publication:

Co-optimization of lithographic and patterning processes for improved EPE performance

Date

2017
Proceedings Paper
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dc.contributor.authorMaslow, Mark
dc.contributor.authorTimoshkov, Vadim
dc.contributor.authorKiers, Ton
dc.contributor.authorJee, Tae Kwon
dc.contributor.authorde Loijer, Peter
dc.contributor.authorMorikita, Shinya
dc.contributor.authorDemand, Mark
dc.contributor.authorMetz, Andrew W
dc.contributor.authorOkada, Soichiro
dc.contributor.authorKumar, Kaushik A.
dc.contributor.authorBiesemans, Serge
dc.contributor.authorYaegashi, Hidetami
dc.contributor.authorDi Lorenzo, Paolo
dc.contributor.authorBekaert, Joost
dc.contributor.authorMao, Ming
dc.contributor.authorBeral, Christophe
dc.contributor.authorLariviere, Stephane
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.date.accessioned2021-10-24T08:57:38Z
dc.date.available2021-10-24T08:57:38Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28942
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2257979
dc.source.beginpage101490N
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VI
dc.source.conferencedate27/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Co-optimization of lithographic and patterning processes for improved EPE performance

dc.typeProceedings paper
dspace.entity.typePublication
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