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Silicon surface metal contamination measurements using grazing-emission XRF spectrometry

Date

1997
Proceedings Paper
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenis, Karine
dc.contributor.authorBaeyens, Martien
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorWiener, G.
dc.contributor.authorKidd, S. J.
dc.contributor.authorKnotter, D. M.
dc.contributor.authorDe Bokx, P. K.
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-09-30T08:04:39Z
dc.date.available2021-09-30T08:04:39Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1804
dc.source.beginpage397
dc.source.conferenceScience and Technology of Semiconductor Surface Preparation
dc.source.conferencedate1/04/1997
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage402
dc.title

Silicon surface metal contamination measurements using grazing-emission XRF spectrometry

dc.typeProceedings paper
dspace.entity.typePublication
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