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A novel iso-thermal intermetallic compound insertion bonding approach to improve throughput for 3D die to wafer stacking
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A novel iso-thermal intermetallic compound insertion bonding approach to improve throughput for 3D die to wafer stacking
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Date
2020
Proceedings Paper
https://doi.org/10.1109/ECTC32862.2020.00228
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hou, Lin
;
Derakhshandeh, Jaber
;
Capuz, Giovanni
;
Lofrano, Melina
;
Beyne, Eric
;
Miller, Andy
;
Beyer, Gerald
;
De Wolf, Ingrid
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Metrics
Views
902
since deposited on 2023-06-20
3
last month
2
last week
Acq. date: 2026-01-12
Citations