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A novel iso-thermal intermetallic compound insertion bonding approach to improve throughput for 3D die to wafer stacking

 
dc.contributor.authorHou, Lin
dc.contributor.authorDerakhshandeh, Jaber
dc.contributor.authorCapuz, Giovanni
dc.contributor.authorLofrano, Melina
dc.contributor.authorBeyne, Eric
dc.contributor.authorMiller, Andy
dc.contributor.authorBeyer, Gerald
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.imecauthorHou, Lin
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidextCapuz, Giovanni::0000-0002-5263-4836
dc.contributor.orcidextBeyne, Eric::0000-0002-3096-050X
dc.contributor.orcidimecHou, Lin::0000-0002-9061-9792
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned2023-06-20T10:39:04Z
dc.date.available2023-06-20T10:39:04Z
dc.date.issued2020
dc.identifier.doi10.1109/ECTC32862.2020.00228
dc.identifier.eisbn978-1-7281-6180-8
dc.identifier.issn0569-5503
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42028
dc.publisherIEEE COMPUTER SOC
dc.source.beginpage1442
dc.source.conference70th IEEE Electronic Components and Technology Conference (ECTC)
dc.source.conferencedateJUN 03-30, 2020
dc.source.endpage1447
dc.source.numberofpages6
dc.title

A novel iso-thermal intermetallic compound insertion bonding approach to improve throughput for 3D die to wafer stacking

dc.typeProceedings paper
dspace.entity.typePublication
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