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Optical solutions for contact hole lithography at the 90nm node and beyond
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Optical solutions for contact hole lithography at the 90nm node and beyond
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Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Köhler, C.
;
Elbattay, K.
;
Hansen, S.
;
Finders, Jo
;
Socha, R.
;
van den Broeke, D.
;
Wiaux, Vincent
;
Vandenberghe, Geert
;
Gräupner, P.
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1897
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Acq. date: 2025-12-10
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Metrics
Views
1897
since deposited on 2021-10-14
2
last month
Acq. date: 2025-12-10
Citations