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Optical solutions for contact hole lithography at the 90nm node and beyond

Date

2002
Proceedings Paper
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dc.contributor.authorKöhler, C.
dc.contributor.authorElbattay, K.
dc.contributor.authorHansen, S.
dc.contributor.authorFinders, Jo
dc.contributor.authorSocha, R.
dc.contributor.authorvan den Broeke, D.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGräupner, P.
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-14T22:04:12Z
dc.date.available2021-10-14T22:04:12Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6492
dc.source.conferenceSemicon Japan: SEMI Technology Symposium
dc.source.conferencedate4/12/2002
dc.source.conferencelocationJapan
dc.title

Optical solutions for contact hole lithography at the 90nm node and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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