Publication:

PVD-HfSiON gate dielectrics with Ni-FUSI electrode for 65nm LSTP application

Date

2005-06

Journal article

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Author(s)

Yamamoto, Kazuhiko

;

Kubicek, Stefan

;

Rothschild, Aude

;

Mitsuhashi, Riichirou

;

;

Veloso, Anabela

;

;

Biesemans, Serge

;

De Gendt, Stefan

;

Wickramanayaka, S.

;

;

Journal

Microelectronic Engineering

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