Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM

Metadata

Show full item record

Authors

Blasco, X.; Nafria, M.; Aymerich, X.; Petry, Jasmine; Vandervorst, Wilfried

Issue

12

Journal

IEEE Trans. Electron Devices

Volume

52

Title

Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM

Publication type

Journal article

Collections

Articles