Publication:
Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM
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1958 since deposited on 2021-10-16
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Acq. date: 2026-05-18
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1958 since deposited on 2021-10-16
1last month
1last week
Acq. date: 2026-05-18
Citations