Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale

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Authors

Blasco, Xavier; Nafria, M.; Aymerich, X.; Vandervorst, Wilfried

Issue

12

Journal

Electronics Letters

Volume

41

Title

Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale

Publication type

Journal article

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