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Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale

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1887 since deposited on 2021-10-16
1last month
Acq. date: 2026-01-07

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1887 since deposited on 2021-10-16
1last month
Acq. date: 2026-01-07

Citations