Tall triple-gate device with TiN/HfO2 gate stack

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Authors
Collaert, Nadine; Demand, Marc; Ferain, Isabelle; Lisoni, Judit; Singanamalla, Raghunath; Zimmerman, Paul; Yim, Yong Sik; Schram, Tom; Mannaert, Geert; Goodwin, Michael; Hooker, Jacob; Neuilly, Francois; Kim, Myeong-Cheol; De Meyer, Kristin; De Gendt, Stefan; Boullart, Werner; Jurczak, Gosia; Biesemans, Serge
Conference
Symposium on VLSI Technology. Digest of Technical Papers
Title
Tall triple-gate device with TiN/HfO2 gate stack
Publication type
Proceedings paper
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