Publication:

Tall triple-gate device with TiN/HfO2 gate stack

Date

2005

Proceedings Paper

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Author(s)

Collaert, Nadine

;

;

Ferain, Isabelle

;

;

Singanamalla, Raghunath

;

Zimmerman, Paul

;

;

;

Mannaert, Geert

;

Goodwin, Michael

;

;

Neuilly, Francois

;

Kim, Myeong-Cheol

;

De Meyer, Kristin

;

De Gendt, Stefan

;

Boullart, Werner

;

;

Biesemans, Serge

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1997 since deposited on 2021-10-16

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Acq. date: 2026-08-07