Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Degradation and breakdown of 0.9 nm EOT SiO2/ ALD HfO2/metal gate stacks under positive constant voltage stress
Metadata
Show full item record
Authors
Degraeve, Robin
;
Kauerauf, Thomas
;
Cho, Moon Ju
;
Zahid, Mohammed
;
Ragnarsson, Lars-Ake
;
Brunco, David
;
Kaczer, Ben
;
Roussel, Philippe
;
De Gendt, Stefan
;
Groeseneken, Guido
Conference
Technical Digest International Electronic Devices Meeting (IEDM)
Title
Degradation and breakdown of 0.9 nm EOT SiO2/ ALD HfO2/metal gate stacks under positive constant voltage stress
Publication type
Proceedings paper
Collections
Conference contributions
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login