RBS, AES and XPS analysis of ion beam induced nitridation of Si and SiGe alloys
dc.contributor.author | De Coster, Walter | |
dc.contributor.author | Brijs, Bert | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Alay, Josep Lluis | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.date.accessioned | 2021-09-29T12:40:27Z | |
dc.date.available | 2021-09-29T12:40:27Z | |
dc.date.issued | 1994 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/103 | |
dc.source | IIOimport | |
dc.title | RBS, AES and XPS analysis of ion beam induced nitridation of Si and SiGe alloys | |
dc.type | Journal article | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 389 | |
dc.source.endpage | 395 | |
dc.source.journal | Vacuum | |
dc.source.issue | 4 | |
dc.source.volume | 45 | |
imec.availability | Published - open access | |
imec.internalnotes | Paper from the 3rd Conference on Analysis by a Combination of Ion Beam (Accelerator-Based) and Surface Specific Techniques; April 1993; Namur, Belgium |