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Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process
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Authors
Kang, JinFeng
;
Yu, HongYu
;
Ren, C.
;
Yang, H.
;
Sa, N.
;
Liu, X.Y.
;
Han, R.Q.
;
Li, M.F.
;
Chan, D.S.H.
;
Kwong, D.L.
Conference
Proceedings of the 35th European Solid-State Device Research Conference - ESSDERC
Title
Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process
Publication type
Proceedings paper
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