Observation and characterization of defects in HfO2 high-k gate dielectric layers

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Authors

Kaushik, Vidya; Claes, Martine; Delabie, Annelies; Van Elshocht, Sven; Richard, Olivier; Rohr, Erika; Witters, Thomas; Caymax, Matty; De Gendt, Stefan; Heyns, Marc

Issue

5_6

Journal

Microelectronics Reliability

Volume

45

Title

Observation and characterization of defects in HfO2 high-k gate dielectric layers

Publication type

Journal article

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