Authors

Kesters, Els; Le, Quoc Toan; Boullart, Werner; Han, Q.; Berry, I.; Waldfried, C.; Mertens, Paul; Heyns, Marc

Conference

Cleaning Technology in Semiconductor Devices Manufacturing IX

Title

Evaluation of the degree of damage after different conditions of He/H2 dry strip plasma on silica-based porous low-k materials - compatiblity study with chemical solutions

Publication type

Proceedings paper